Invitation Program for Japanese American Leadership Delegation


We are now accepting applications for the 2020 Japanese American Leadership Delegation (JALD) invitation program to Japan. The JALD program provides the opportunity for a select group of Japanese American leaders from across the United States to travel to Japan to engage with Japanese leaders in the business, government, academic, non-profit and cultural sectors.
Applications must be submitted via email, fax, or mail to your local consular office by Friday, September 13, 2019. Please see the links below for a list of consular offices in the United States. Applicants residing in Florida should submit applications to the Consulate General of Japan in Miami.
The itinerary for the 2020 delegation will include travel to Tokyo and Shizuoka. Transportation, hotel, and meals will be provided. Please be advised that, if selected, you must be able to travel to Japan from March 6 - 14, 2020, and attend the mandatory orientation in Los Angeles from January 31 to February 1, 2020.
Selection for the 2020 delegation will give greater consideration to individuals with extensive experience in the following sectors:
・Local, state or regional government including appointed and elected officials
・Senior administrators in higher education
・Senior executives in business
・Communications and media
Selection Criteria will include:
・Successful and senior leadership in one’s profession
・High level of interest or experience in U.S.-Japan relations
・Commitment to strengthening U.S.-Japan relations in the future
・Interest in expanding the role of Japanese Americans in U.S.-Japan relations
・Representation from geographic areas not included in prior delegations In principle, delegates should be 40 to 55 years of age to enable longer-term opportunities to build U.S.-Japan relations in their respective professional and community activities. In reflecting the goals of the program, priority will be given to sansei, yonsei and gosei, including Japanese Americans of multi-racial background.
For more information, please see the following: